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I have been involved in different areas of research activities related to elemental, structural, and electrical characterization of surfaces and interfaces in bulk and in thin film samples. My research activities are classified as follows:

1. Heavy ion beam irradiation and modification of bi-layer thin films or metal thin films on semiconductor, and the characterization of the resulting atomic diffusion (ion mixing) across the interface using Rutherford backscattering spectrometry (RBS), in conjunction with electrical resistivity measurements.
2. X-Ray Fluorescence Spectrometry (XRF) using x-ray tube and radioactive isotopes, to the analysis of industrial, food, agricultural and geological materials; In addition to the Measurements of the x-ray cross sections and other fundamental parameters using different single element standard samples.
3. Proton induced x-ray emission (PIXE) using ion beam accelerator, to do elemental analysis of different kind of samples, in addition to production cross section measurements using different single element standard samples.
4. Contributing to the construction of an X-Ray Scanning tomography system, and its application in medical and biological fields.
5. Recently I am involved in characterization of thin film parameters, using a new computerized (Film Tech) optical system based on optical reflection and refraction. This system combines fiber-optic spectro-photometry with advanced material modeling software and spectral density analysis to provide simultaneous measurement of film thickness, index of refraction, extinction coefficient, energy band gap, composition, crystallinity, and surface roughness of thin films.
It is my goal to develop research projects based on thin film applications, and welling to make positive contribution to any other related fields of research.